Refurbished Branson IPC 3000
Rapid Thermal Processor

The Branson IPC 3000 series is a barrel plasma etcher that uses oxygen to etch organic films and residues such as photoresist in a process commonly refferred to as "de-scumming".

During a normal run fort he Branson Barrel Etcher, the chamber is evacuated to under 0.5 torr pressure. A regulated flow of oxygen gas is introduced into the chamber and RF energy is applied tot he chamber coils, which creates an oxygen plasma which does the etching.

The oxygen ions in the plasma react with organics, such as photoresist, oxidizing or descumming the compounds off oft he surface. The oxidized organics are pumped out oft he Branson Barrel Etcher's chamber as exhaust gas. Wafers are processed in batch by means a chemical reaction.

New upgraded Branson IPC 3000 system is getting rid oft he old logic relays controllers to use new PC computer with DOS-WINDOW graphics GUI, which has touch screen capability. New upgraded Branson IPC 3000 system is also getting rid oft he old RF Generator to use normal ENI RF Generator.

Key Features: Batch wafer Processing

Advantages of upgraded system:

The AW Series Software provides the unique upgrade system for Branson IPC Series 2000/3000/L3100/L3200